Taiwan: Engineering Mitsubishi Gas Chemical to Build Industrial Hydrogen Peroxide Production Unit
With an aim to expand Mitsubishi Gas Chemical’s super-pure hydrogen peroxide business, the company has plans to establish a new production facility which will enable the firm to meet the growing global demand for semiconductors.
Japan – Mitsubishi Gas Chemical (MGC) Company has plans to build a production facility for industrial hydrogen peroxide (IHP) at its Taiwanese subsidiary in order to further develop the company’s business for super-pure hydrogen peroxide (SPHP) used in semiconductor production processes.
SPHP is used primarily as a cleaning, etching and abrading agent in semiconductor wafer and device manufacturing processes. Demand for semiconductors is expected to grow over the long term as they find increasing use due to future advancements in 5G, IOT, cloud computing, AI, and other technologies. Along with this trend, the increasing miniaturisation in semiconductor wiring processes leads to higher demand for greater volumes of SPHP featuring even higher quality.
In Taiwan, many semiconductor foundries (commissioned producers) are building huge semiconductor fabrication plants employing the world’s most advanced technologies one after another. High investments are also planned going forward. These developments cause a sharp increase in demand for high-quality SPHP.
MGC aims to meet this demand and to produce and distribute SPHP characterised by stable supply, high quality, and excellent cost-competitiveness, and thus to promote business expansion. To this end, the company will develop integrated local production–from IHP raw material (RHP) to SPHP–in which the future IHP production facility will supply RHP to the currently operating SPHP facility.
By strengthening its supply structure, the company aims to contribute to the semiconductor industry growth that will likely continue globally and over the long term.