Business Strategy Fujifilm Develops New Building for Advanced Semiconductor Materials

Source: Press release Fujifilm 2 min Reading Time

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With an aim to strengthen the company’s capabilities for performance and quality evaluation of development products, accelerate the development of new materials for advanced and next-generation semiconductors and ensure a stable supply of high-quality products, Fujifilm has developed a new building for advanced semiconductor materials.

Exterior photo of the new building. (Source:  Fujifilm)
Exterior photo of the new building.
(Source: Fujifilm)

Tokyo/Japan – Fujifilm Corporation has recently announced the successful completion of a new building for development and evaluation at the Shizuoka Factory of Fujifilm Electronic Materials Co. (FFEM), the core company that leads Fujifilm’s semiconductor materials business, with operations commencing in November. This investment strengthens the company’s capabilities for performance and quality evaluation of development products, accelerating the development of new materials for advanced and next-generation semiconductors and ensuring a stable supply of high-quality products. Fujifilm will further accelerate the growth of its semiconductor materials business to meet the rapidly increasing demand for semiconductors supporting advanced information society, such as those for AI data centers.

In recent years, the semiconductor market has grown rapidly due to the spread of AI, 5G, and IoT, with particularly strong demand for advanced semiconductors such as those used in AI applications. Fujifilm’s semiconductor materials business has expanded its sales by approximately 1.7 times from FY2021 to FY2024, becoming one of the core businesses driving the growth of the Fujifilm Group. To support this growth, Fujifilm has invested over 100 billion yen in facilities from FY2021 to FY2024, and plans to invest an additional 100 billion yen or more from FY2025 to FY2026.

The new building at the Shizuoka Factory is equipped with state-of-the-art evaluation equipment in a high-cleanliness cleanroom, enhancing quality evaluation functions for development and production. AI image recognition technology has been introduced to inspect fine particles contained in semiconductor materials, improving analysis accuracy and establishing an advanced quality control system utilizing AI. Furthermore, a department promoting digital transformation (DX) has been established in the new building to support the expansion of digital technologies such as AI in manufacturing processes, thereby improving product quality and ensuring stable supply.

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As part of business continuity planning (BCP), the building adopts an RC column-head seismic isolation structure and locates the cleanroom 12 meters above ground to prepare for potential flooding.

The Shizuoka Factory collaborates with global R&D and production bases to support customers’ cutting-edge process technology development, not only for the Japanese market but worldwide.

With the launch of the new building, Fujifilm will accelerate the development of advanced resists for EUV (Extreme Ultraviolet), Arf, NIL, PFAS-free materials, and the world-leading Wave Control Mosaic, contributing to the advancement of next-generation semiconductors.

Previous investments have also strengthened the development and mass production systems for core materials such as polyimides for next-generation semiconductor packaging. Fujifilm will continue to expand production capacity and develop technologies to meet diverse customer needs, including increasing demand for AI semiconductors.

Through this investment in the new building at the Shizuoka Factory, Fujifilm will further strengthen its development and production systems for semiconductor materials, leading the growth of the advanced and next-generation semiconductor market, which is expected to double by 2030, and accelerating the expansion of its semiconductor materials business and overall group growth.

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